You are cordially invited to participate in the XI-th International Conference "Ion Implantation and Other Applications of Ions and Electrons", ION 2016. The conference will be held in Kazimierz Dolny, Poland, from June 13 to June 16, 2016.

The idea of ION Conferences has been stimulated by the permanent success and steady increasing interest in ion implantation techniques, which have emerged from fundamental research in ion and plasma physics and established themselves as standard methods for material modification and characterization.

The following topics represent the focus of the ION 2016:

• formation and modification of subsurface layers using ion, electron and plasma electron technologies,

• ion beam micro- and nano-engineering,

• plasma – based and ion beam – assisted deposition method,

• research methods with application of ions and electrons,

• fundamentals of ion beam interactions with solids.

 The range of materials includes metals, semiconductors, insulators, polymers, etc.

YOUNG SCIENTISTS CONTEST

During the ION 2016 Conference a special Young Scientists Session will be organized. Prizes will be awarded for the best 15 minutes oral and poster presentations. The Contest aims at Ph.D. students and scientists with not more than 6 years after their Ph.D. defence. The jury will be appointed by the Scientific Committee of the ION 2016 Conference.

In order to participate in the Young Scientists Contest, a candidate is asked to submit a short CV together with an abstract not later than April 15, 2016. The candidate should be a first author of the presentation.

CONTRIBUTIONS

In addition to the invited lectures, contributions for 15 minutes oral presentation will be selected from the submitted abstracts. Remaining contributions will be presented in poster sessions. The Proceedings of the Conference, containing papers accepted by referees, will be published.

ION 2016 SITE

The ION 2016 Conference will be held at the "Dom Dziennikarza" hotel in Kazimierz Dolny, a beautiful and historical little town on the Vistula river, 120 km from Warsaw. The hotel, which is the accomodation place for most of the participants, is situated within a walking distance from the town's center. Full board, including breakfasts, lunches and evening meals will be served at the hotel restaurant.

We would like to ask everybody wishing to attend the ION 2016 to complete the attached registration card and return it to the Conference Secretariat not later than March 20, 2016.

The official language of the Conference is English.

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February 10, 2016

LIST OF CONFIRMED INVITED TALKS (tentative titles)

Bengt Svensson, University of Oslo, Norway, Oxide Semiconductors: Ion Implantation and Defects

Feng Chen, Shandong Univ., China, Ion beam irradiation applied to optical crystals and 2D materials towards applications in integrated photonics

Wilhelm Kegel, centrotherm AG, Blaubeuren, Germany, Enabling Processing Strategies for Advanced Semiconductor Manufacturing

Enrico Napolitani, Univ. of Padova, Italy, Advanced strategies for shallow junction formation in Ge

Slawomir Prucnal, Helmholtz-Zentrum Dresden-Rossendorf, Germany, Ge comeback - new properties of an old material

Ye Yuan, Helmholtz-Zentrum Dresden-Rossendorf, Germany, Ferromagnetic semiconductors: Preparation and tailoring by ion implantation

Yonder Berencen, Helmholtz-Zentrum Dresden-Rossendorf, Germany, Non-equilibrium thermal processing for hyperdoping Si

Halina Krzyzanowska, Vanderbilt University, Nashville, USA and Maria Curie-Skłodowska University, Lublin, Poland, Characterization of implanted semiconductors using coherent acoustic phonon spectroscopy